Thin Film Growth and Characterization
- Si, Strained Si, Ge, SiGe(C), SiC, Diamond, Silicide, Compound semiconductors
- III-nitrides, Oxide semiconductors,High-k insulator, Low-k insulator
- CVD, MBE, Selective epitaxy, Atomic layer control, Novel growth technique
- Band engineering, Defect engineering, Theory and simulation, and modeling
Surface and Interface Control
- Surface passivation and modification, Surface and interface chemistry, Schottky and ohmic contacts
- Atomic scale characterization of surfaces and interfaces
- Surface/interface issues in advanced devices
Formation and Characterization of Nanostructures
- Nanodots, Nanowires, Superlattice, 2D materials, Self-assembling, Self-organization
- Nanoscale characterization, In-situ characterization
Process and Device Technology
- Impurity diffusion, Dry etching, Microfabrication, Isolation
- SiGe gate, Source/drain and channel engineering, Base/emitter engineering
- SOI, SGOI, III-V on Si, Wafer bonding, Virtual substrates and their Manufacturing
- CMOS, HBT, BiCMOS, FeRAM, MODFET, SET, RTD, LED, LD, OEIC